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        Product laser

        Products
        Wafer Level TGV Laser Micro-Drilling System
        Product Introduction
        This system utilizes a precise motion control platform combined with advanced laser modification technology to perform high-density micro-hole and micro-trench processing on various glass substrates. This is a crucial manufacturing step before metallization processes for semiconductors and display packaging applications.
        Product Features

        Excellent material compatibility supports quartz, borosilicate, soda-lime, aluminosilicate, and other specialty glass types

        Flexible patterning capabilities enable fabrication of round holes, square holes, blind vias, through vias, and micro-grooves as required

        Outstanding deep-hole processing with aspect ratio up to 1:100, minimum hole diameter ≤ 5 μm

        Good hole quality with smooth inner-side walls that are free of cracks and burs

        High throughput and capacity optimized for large-scale production

        Precise positioning and repeatability for micro-level accuracy


        Field of application
        Glass-based chip packaging, display chip encapsulation, etc.
        Technical indicators
        Specification
        Details
        Substrate Size
        4 to 12-inch round or square wafers
        Loading Method
        Automated cassette feed (basket-type) for 4 to 12-inch wafers
        Processing Type
        Fixed-beam laser + high-precision motion platform
        Platform Speed
        ≤ 1000 mm/s
        Hole Shapes
        Circular, square, blind via, through via, micro-trench
        Minimum Hole Diameter
        5 μm
        Maximum Aspect Ratio
        1:100
        Platform Accuracy
        Repeatability ≤ ±1 μm; Positioning accuracy < ±2 μm
        Pattern Placement Accuracy
        ≤ ±3 μm within a 300 mm processing range
        Throughput
        ≥ 5000 points per second

        Application Cases
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